JEL STWCR4160-300-PM Waterproof 4-axis cylindrical coordinate clean mechanical arm
Characteristics of STWCR4160-300-PM waterproof 4-axis cylindrical coordinate manipulator;
Waterproof 4-axis cylindrical coordinate manipulator STWCR4000 series (equipped with 300 mm wafer turnover mechanism and edge clamping mechanism)
Able to transport semiconductor wafers in acidic and alkaline fog environment
Standard arm length of mechanical arm: 160 mm, 200 mm.
Teflon coating is used for arm parts to ensure corrosion resistance.
V-shaped sealing ring is used for waterproof structure of arm joint.
Sealing strips made of Viton are used for the joint surfaces between parts.
The bellows can be used for the waterproof structure of Z axis.
The double-arm structure can shorten the arm action time when replacing wafers.
Equipped with action monitor
Control communication mode: RS232C and parallel port I/O mode.
The whole shaft adopts 2-phase stepping motor.
S-curve acceleration and deceleration control mode can transport semiconductor wafers at high speed and high precision.
Wafer fixing methods: vacuum adsorption type, bottom support type and edge clamping type.
Fingers can be provided according to the actual situation of handling objects and the layout of customer equipment.
Basic parameters of waterproof 4-axis cylindrical coordinate clean robot arm STWCR4160-300-PM;
operational environment | The atmospheric environment in the clean room |
arm | arms |
Arrival distance | 315mm (the distance from the center of the third joint of the arm) |
Maximum stroke of lifting shaft |
300mm |
Transportable quality | 3kg (reference at the third joint of the arm) |