Home Page    Semiconductor    Wafer handling manipulator/hand    JEL STCR4160SN-V 4-axis cylindrical coordinate clean robot arm
2

JEL STCR4160SN-V 4-axis cylindrical coordinate clean robot arm

Characteristics of STCR4160SN-V_4 axis cylindrical coordinate clean manipulator;

4-axis cylindrical coordinate cleaning robot arm suitable for super clean room

On the basis of maintaining high cost performance and high-speed transmission characteristics, the common step loss problem of stepping motor is solved.

A new type of dual-arm manipulator suitable for thinning wafers and vacuum adsorption in the peripheral area of wafers

The stepping motor is controlled by a control mode that will not lose step.

The third joint of high-strength arm/arm can bear 3kg force (including wrist mechanism module and wafer mass).

To meet the equipment requirements, you can choose the base fixing method or the flange fixing method.

 

Basic parameters of 4-axis cylindrical coordinate clean manipulator STCR4160SN-V;

operational environment The atmospheric environment in the clean room
arm arms
Arrival distance 475mm (the distance from the center of the third joint of the arm)
Maximum stroke of lifting shaft

200mm / 300mm / 400mm / 450mm / 500mm 

Transportable quality 3kg (reference at the third joint of the arm)

 

Product Center

PRODUCT