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JEL SCR3100S 4-axis cylindrical coordinate cleaning robot arm for small-diameter wafer

Characteristics of 4-axis cylindrical coordinate cleaning robot arm for SCR3100S small-diameter wafer;

  • SCR3100S series of 3-axis cylindrical coordinate cleaning robot arm suitable for super clean room.
  • It is suitable for carrying small-sized wafers in semiconductor production equipment and inspection equipment. By optimizing the space size of the robot arm,
  • Conducive to the miniaturization of equipment.
  • Methods to improve cleanliness: Install a 0.1µm filter at the exhaust port inside the arm.
  • To meet the equipment requirements, you can choose the base fixing method or the flange fixing method.
  • Equipped with action monitor
  • Control communication mode: RS232C and parallel port I/O mode.
  • The whole shaft adopts 2-phase stepping motor.
  • S-curve acceleration and deceleration control mode can transport semiconductor wafers at high speed and high precision.
  • Wafer fixing methods: vacuum adsorption type, bottom support type and edge clamping type.
  • Finger material: CFRP (carbon fiber), aluminum alloy, high-purity ceramics and other optional materials.
  • Fingers can be provided according to the actual situation of handling objects and the layout of customer equipment.

 

Basic parameters of 4-axis cylindrical coordinate cleaning robot arm for SCR3100S small-diameter wafer;

operational environment The atmospheric environment in the clean room
arm single-arm
Arrival distance 195mm (the distance from the center of the third joint of the arm)
Maximum stroke of lifting shaft

200mm / 300mm

Transportable quality 0.5kg (reference at the third joint of the arm)

 

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