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JEL SCR3100S 4-axis cylindrical coordinate cleaning robot arm for small-diameter wafer
JEL SCR3100S 4-axis cylindrical coordinate cleaning robot arm for small-diameter wafer
Characteristics of 4-axis cylindrical coordinate cleaning robot arm for SCR3100S small-diameter wafer;
- SCR3100S series of 3-axis cylindrical coordinate cleaning robot arm suitable for super clean room.
- It is suitable for carrying small-sized wafers in semiconductor production equipment and inspection equipment. By optimizing the space size of the robot arm,
- Conducive to the miniaturization of equipment.
- Methods to improve cleanliness: Install a 0.1µm filter at the exhaust port inside the arm.
- To meet the equipment requirements, you can choose the base fixing method or the flange fixing method.
- Equipped with action monitor
- Control communication mode: RS232C and parallel port I/O mode.
- The whole shaft adopts 2-phase stepping motor.
- S-curve acceleration and deceleration control mode can transport semiconductor wafers at high speed and high precision.
- Wafer fixing methods: vacuum adsorption type, bottom support type and edge clamping type.
- Finger material: CFRP (carbon fiber), aluminum alloy, high-purity ceramics and other optional materials.
- Fingers can be provided according to the actual situation of handling objects and the layout of customer equipment.
Basic parameters of 4-axis cylindrical coordinate cleaning robot arm for SCR3100S small-diameter wafer;
operational environment | The atmospheric environment in the clean room |
arm | single-arm |
Arrival distance | 195mm (the distance from the center of the third joint of the arm) |
Maximum stroke of lifting shaft |
200mm / 300mm |
Transportable quality | 0.5kg (reference at the third joint of the arm) |