MITO DENKO SOURCE-1250 Molecular beam evaporation source

Brief introduction of characteristics of molecular beam evaporation source SOURCE-1250;

• The molecular beam evaporation source is used for preparing MBE-grown thin films in ultra-high vacuum.
• Open evaporation source, which is designed to minimize gas emission when molecular beam is radiated.
• Installation flange: ICF070・114, etc.
• Temperature control: Max1250 is controlled by PID.

Molecular beam evaporation source SOURCE-1250 specifications:

(1) crucible capacity: about 10cc (lip is about 15mm x 57mm)

(2) crucible material PBN

(3) The heater is coiled with high purity Ta wire

(4) Five layers of high-purity Ta on the side reflector

(5) High-purity Mo of heating element support base

(6) Thermocouple Pr13

(7) The external shape of the heating element is Φ 35 x 50 mm.

(8) Operating temperature range is 300°C to 1250 C.

(9) The shutter is opened/closed by a micro flange rotary import machine (standard manual: air drive is optional).

(10) mounting flange 114CF (4.5 "CF)

(11) heating power supply 1KW DC power supply with current and voltage limitation.

(12) Temperature controller: PID control mode is RT~1800°C, and the maximum control accuracy is 0.1 C.

(13) Maximum baking temperature: 250°C (after removing the cable and air drive device)