Home Page    Semiconductor    Wafer handling manipulator/hand    JEL MCR3160C 3-axis cylindrical coordinate clean wafer handling robot arm
4

JEL MCR3160C 3-axis cylindrical coordinate clean wafer handling robot arm

Characteristics of 3-axis cylindrical clean wafer handling robot MCR3160C;

  • 300mm wafer for ultra-clean and dust-free room corresponds to MCR3000C series.
  • Suitable for wafer handling in semiconductor production equipment and testing equipment.
  • The whole shaft adopts AC servo motor to meet the demand of high-speed transportation.
  • It has a better cost performance advantage than MHR series.
  • Standard arm length of mechanical arm: 160mm, 200mm.
  • To meet the equipment requirements, you can choose the base fixing method or the flange fixing method.
  • Equipped with action monitor
  • Control communication mode: RS232C and parallel port I/O mode.
  • AC servo motor with absolute encoder specification for the whole shaft.
  • S-curve acceleration and deceleration control mode can transport semiconductor wafers at high speed and high precision.
  • Wafer fixing methods: vacuum adsorption type, bottom support type, edge clamping type and Bernoulli non-contact type.
  • Finger material: CFRP (carbon fiber), aluminum alloy, high-purity ceramics and other optional materials.
  • Fingers can be provided according to the types of objects to be transported, equipment layout and other requirements.

 

Basic parameters of 3-axis cylindrical coordinate clean wafer handling robot MCR3160C;

operational environment The atmospheric environment in the clean room
arm single-arm
Arrival distance 400mm (the distance from the center of the third joint of the arm)

升Maximum stroke of descending shaft

300mm / 400mm / 500mm

Transportable quality 4kg (reference at the third joint of the arm)

 

Product Center

PRODUCT