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Wafer handling manipulator/hand
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JEL MCR3160C 3-axis cylindrical coordinate clean wafer handling robot arm
JEL MCR3160C 3-axis cylindrical coordinate clean wafer handling robot arm
Characteristics of 3-axis cylindrical clean wafer handling robot MCR3160C;
- 300mm wafer for ultra-clean and dust-free room corresponds to MCR3000C series.
- Suitable for wafer handling in semiconductor production equipment and testing equipment.
- The whole shaft adopts AC servo motor to meet the demand of high-speed transportation.
- It has a better cost performance advantage than MHR series.
- Standard arm length of mechanical arm: 160mm, 200mm.
- To meet the equipment requirements, you can choose the base fixing method or the flange fixing method.
- Equipped with action monitor
- Control communication mode: RS232C and parallel port I/O mode.
- AC servo motor with absolute encoder specification for the whole shaft.
- S-curve acceleration and deceleration control mode can transport semiconductor wafers at high speed and high precision.
- Wafer fixing methods: vacuum adsorption type, bottom support type, edge clamping type and Bernoulli non-contact type.
- Finger material: CFRP (carbon fiber), aluminum alloy, high-purity ceramics and other optional materials.
- Fingers can be provided according to the types of objects to be transported, equipment layout and other requirements.
Basic parameters of 3-axis cylindrical coordinate clean wafer handling robot MCR3160C;
operational environment | The atmospheric environment in the clean room |
arm | single-arm |
Arrival distance | 400mm (the distance from the center of the third joint of the arm) |
升Maximum stroke of descending shaft |
300mm / 400mm / 500mm |
Transportable quality | 4kg (reference at the third joint of the arm) |